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KMID : 1011420090140010057
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Journal of Korean Ophthalmic Optics Society
2009 Volume.14 No. 1 p.57 ~ p.62
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The Study of Color and Hardness of TiN Thin Film by UBM Sputtering System
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Park Moon-Chan
Lee Jong-Geun
Joo Kyung-Bok
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Abstract
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Purpose: TiN films were deposited on sus304 by unbalanced magnetron sputtering system which was designed and developed as unbalancing the strength of the magnets in the magnetron electrode. The color and hardness of deposited TiN films was investigated.
Methods: The cross sections of deposited films on silicon wafer were observed by SEM to measure the thickness of the films, the components of the surface of the films were identified by XPS, the components of the inner parts of the films were observed by XPS depth profiling. XPS high resolution scans and curve fittings of deposited films were performed for quantitative chemical analysis, Vickers micro hardness measurements of deposited films were performed with a nano indenter equipment.
Results: The colors of deposited films gradually changed from light gold to dark gold, light violet, and indigo color with increasing of the thickness. It could be seen that the color change come from the composite change of three compound, TiOxNy, TiO2, TiN. Especially, the composite change of TiOxNy compound was thought to affect the color change with respect to thickness.
Conclusions: Deposited films had lower than the value of general TiN film in Vickers hardness, which was caused by mixing three TiN, TiO2, TiOxNy compound in the deposited films. The increasing and decreasing of micro hardness with respect to thickness was thought to have something to do with the composite of TiN in the films.
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KEYWORD
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UBM sputter, TiN coating, XPShardness
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